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  • P-ISSN 1225-0163
  • E-ISSN 2288-8985

Effect of Surface Charging on the SIMS Depth Profile of Bismuth Titanate Thin Film

Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985
2001, v.14 no.6, pp.486-493
Kim, Jae Nam
Lee, Sang Up
Kwun, Hyug Dae
Shin, Kwang Soo
Chon, Uong
Park, Byung Ok
Cho, Sang Hi
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Abstract

The effect of SIMS analysis conditions such as mesh grid, offset voltage and ion species on the in-depth profile for bismuth titanate thin film was examined in terms of charging effect and detection limit. The results shows that the use of offset voltage -40 V reduces the charging effect and the detection limit. The employment of mesh grid in sample preparation leads to the reduction of the charging effect in small amount, but deteriorate the detection limit. Utilization of primary <TEX>$O^-$</TEX> ion for SIMS analysis of bismuth titanate thin film showed almost the same effect as using offset voltage -40 V. However, it takes approximately triple acquisition time than using <TEX>$O_2{^+}$</TEX> ion due to the poor beam current of the source in the experiment.

keywords
SIMS, bismuth titanate, FRAM, charging effect, depth profile


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