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- E-ISSN 2288-8985
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Electron Probe Micro Analysis of Cs in <TEX>$UO_2$</TEX>
Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985
2001, v.14 no.3, pp.203-211
Park,
S. D., Joe,
K. S., &
Kim,
W.
H.
(2001). Electron Probe Micro Analysis of Cs in <TEX>$UO_2$</TEX>. Analytical Science and Technology, 14(3), 203-211.
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Abstract
In this paper it was described on the intereference effect of uranium to analyze Cs in <TEX>$UO_2$</TEX> by Electron Probe Micro Analysis(EPMA) and the beam stability of Cs <TEX>$L_{\alpha}$</TEX> X-ray intensity for some Cs compounds. According to the experimental results, the CsI showed the highest <TEX>$L_{\alpha}$</TEX> X-ray intensity among the tested Cs compounds at the experimental condition; 15~30 kV of accelerating voltage and PET, LiF crystal. When 100 nA of beam current was applied to Cs compounds, Cs <TEX>$L_{\alpha}$</TEX> X-ray intensity was continuously decreased with increasing time. The decreasing rate of Cs <TEX>$L_{\alpha}$</TEX> X-ray intensity was directly proportional to the applied beam current and accelerating voltage but inversely proportional to the applied beam size. It was found that uranium interference can be prevented by using Cs <TEX>$L_{\alpha}$</TEX> X-ray wavelength of Lif crytal for Cs analysis in <TEX>$UO_2$</TEX> by EPMA.
- keywords
- EPMA, WDS, Cs, <TEX>$UO_2$</TEX>
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