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- E-ISSN 2288-8985
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Treatment of Halogen Gases, BCI3 and CF4, used in Semiconductor Process by Using Inorganic Gas Adsorption Agents
Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985
2003, v.16 no.5, pp.368-374
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(2003). Treatment of Halogen Gases, BCI3 and CF4, used in Semiconductor Process by Using Inorganic Gas Adsorption Agents. Analytical Science and Technology, 16(5), 368-374.
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Abstract
Halogen gases such as <TEX>$BCl_3$</TEX> and <TEX>$CF_4$</TEX> are among the most problematic gases used in semiconductor process. They raise serious environmental and health problems due to their extreme toxicity. This study is to develop a method to effectively remove those gases during the process by using various types of inorganic gas adsorption agents such as zeolite A, modified AgA zeolite, ZnO, and <TEX>$AgMnO_3$</TEX>, which have not been attempted in the conventional methods. The removal efficiencies of the gases were both qualitatively and quantitatively measured by a FT-IR spectrophotometer. The whole device for the measurement has been designed and built in our lab. The removal efficiencies of the gases were compared between those used resins. The experimental result revealed that ZnO showed the best removal efficiency for BCl3 gas that had removed 0.094 g per 1 g of the resin used. For <TEX>$CF_4$</TEX> gas, none of the solid resins was able to remove the gas effectively. However, liquid <TEX>$CHCl_3$</TEX> showed some removal ability of the <TEX>$CF_4$</TEX> gas.
- keywords
- <TEX>$BCl_3$</TEX>, <TEX>$CF_4$</TEX> gas treatment, Zeolite, <TEX>$AgMnO_3$</TEX>, ZnO, Semiconductor process
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