Past, Present and Future of the Dental Implant Topography

Young-Taek Kim; 김영택

doi:10.22974/jkda.2021.59.4.003

ISSN : 0376-4672

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치과 임플란트 표면의 과거, 현재, 그리고 미래

Past, Present and Future of the Dental Implant Topography

김영택 (국민건강보험공단 일산병원)

대한치과의사협회지 / The Journal of the Korean Dental Association, (P)0376-4672; (E)2713-7961

2021, v.59 no.4, pp.226-231

https://doi.org/10.22974/jkda.2021.59.4.003

김영택. (2021). 치과 임플란트 표면의 과거, 현재, 그리고 미래. 대한치과의사협회지, 59(4), 226-231, https://doi.org/10.22974/jkda.2021.59.4.003

복사

Abstract

Osseointegration means the interlocking of bone and implant surface. The surface of dental implants played a key role for osseointegration. Commercially pure titanium implants (CPTi) grade 4 implant shows high corrosion resistance and fatigue strength. Most commercial implants use this Titanium and modify the surface with moderate roughness (1~100μm). Moderately roughness offers most effective bone to implant contact and highest removal torque based on the biological stability. As in the surface roughness, biofilm can be formed easily, peri-implantitis is a next challenge of the implant surface modification. It has been expected to overcome the biological complication of dental implants with the nano technology. However, nano technology has been studied limitedly in the laboratory. The implant surface will be developed with the aim of having fast osseointegration, long-term BIC interlocking, and high bacterial resistance.

keywords: Dental implants, Osseointegration, Titanium, Bone-implant interface

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59권 4호

치과 임플란트 표면의 과거, 현재, 그리고 미래

Past, Present and Future of the Dental Implant Topography

Abstract

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