- P-ISSN 1225-0163
- E-ISSN 2288-8985
In this study, polysilanes were synthesized by electroreduction with different monomers such as CH3HSiCl2, PhSiCl3, CH3SiCl3 and (CH3)2SiCl2 by Mg electrodes under ultrasonic radiation. The effects of monomers and additives (p-dibromobenzene (DBB), naphthalene (NAPH) and anthracene (ANTH)) on the reaction rate were investigated. Polymerization of PhSiCl3 among the four monomers showed the highest rate. pdibromobenzene (DBB) was proved the most effective additive. Based on the observations, some possible reaction mechanisms of the polymerization were proposed.
1. A. Yamaguchi, T. Ogawa and H. Tachibana, J. Electrochem.Soc, 143, 657-664(1996).
2. R. D. Miller, D. Hofer, D. Rabolt and G. Fickes, J. Am.Chem. Soc, 107, 2171-2172(1985).
3. H. Kuzmany, J. F. Rabolt, B. L. Farmer and R. D. Miller,Chem. Phys, 85, 7417-7420(1986).
4. F. C. Schilling, A. J. Lovinger and J. M. Ziegler, Macromolecules,22, 3061-3068(1989).
5. H. Suzuki, Adv. Mater, 8, 657-661(1986).
6. H. Suzuki, J. Lumin, 1005, 72-74(1997).
7. H. Suzuki, J. Meyer and J. Slimmerer, Adv. Mater, 5,743-748(1996).
8. A. Fujiki, K. Yoshimoto and Y. Ohmori, Jpn. J. Appl.Phys, 34, 1365-1367(1995).
9. R. D. Miller, D. Hofer and G. N. Fickes, Polym. Eng.Sci, 26, 1129-1136(1986).
10. K. Kanemitsu, K. Suzuki and T. Masumoto, Solid State Commun, 86, 545-548(1993).
11. S. Yajima, J. Hayashi and M. Omori, Chem. Lett, 75,931-934(1975).
12. Y. Hasegawa and K. J. OKamura, Mater. Sci, 20, 321-326(1985).
13. X. Bao, M. J. Edirisinghe and G. F. Fernado, J. Euro.Ceram. Soc, 18, 915-922(1998).
14. R. D. Miller, D. Thompson and R. Sooriyakumaran, J.Polym. Sci. A, 29, 813-824(1991).
15. D. Bratton, J. Holder and J. Simon, J. Organomet.Chem, 685, 60-64(2003).
16. K. Shigenori, I. Manabu and B. B. Hang, Tetrahedron Lett, 38, 4607-4610(1997).
17. A. V. Lori, S. Kevin and J. B. Wang, Electrochimica Acta, 45, 1007-1014(1999).
18. A. V. Lori and K. Hang, Polymer, 41, 441-444(2000).
19. O. Mitsutoshi, T. Takeshi and H. Hiroshi, Electrochimica Acta, 44, 3475-3482(1999).
20. U. Manobu, T. Michio and I. Hiroshi, Electrochimica Acta, 35, 1867-1872(1990).
21. K. Atsutaka, T. Eiji and K. Toshihiro, Organometallics,11, 2899-2903(1992).
22. L. Zhiyin, Organosilicon compounds industry analysis. Beijing. Chemical Industry Press, 63-64(1979).
23. A. Watanabe, Y. Miike and M. Tsutsumi, Macromolecule,26, 2111-2116(1993).
24. F. J. zhang and L. Chen, J. Shanghai Uni., 12, 543-546(2006).
25. S. Wu, L. Chen and F. J. zhang, Polym. Mater. Sci. &Eng., 23, 64-67(2007).
26. R. D. Miller and J. Michl, Chem. Rev, 89, 1359-1410(1989).
27. M. Okano, K. Takeda and T. Toriumi, Electrochim. Acta,44, 659-666(1998).
28. S. M. Xing and Y. L. Wang, Organosilicon Synthetic Technics and Application of the Production. Beijing. Chemical Industry Press. 126-127(2000).
29. J. F. Fu, S. F. Li and J. M. Liu., J. Insulating Material. 22, 92-94(2005).
30. P. Zuren, Polymer Chemistry. Beijing, Chemical Industry Press. 132-133(2003).