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Analysis of Ultra Pure Sulfuric Acid for Semiconductor Using High Resolution ICP-MS
Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985
1998, v.11 no.4, pp.311-315
Heo,
Y., GiI,
J., &
Lim,
H.
(1998). Analysis of Ultra Pure Sulfuric Acid for Semiconductor Using High Resolution ICP-MS. Analytical Science and Technology, 11(4), 311-315.
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Abstract
Ultra trace metal impurities of high-purity sulfuric acid for semiconductor process have been determined in the concentration of lower than ppb (ng/g) level using high resolution inductively coupled plasma mass spectrometer (HR-ICP-MS).The acid samples were evaporated and concentrated by the factor of 20. No clement in the acids exceeded 1ppb level and most of the clements were determined below 10ppt (pg/g). Elements without spectral interference in mass spectrum, such as In, V, Mn, etc, were determined in the concentration of below 1 ppt level The recoveries in the range of 72% to 127.2% for 0.5 ppb spiked sample were obtained.
- keywords
- trace elements analysis, high resolution ICP-MS, acid analysis
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