- P-ISSN 1225-0163
- E-ISSN 2288-8985
- Apply for Authority
- P-ISSN1225-0163
- E-ISSN2288-8985
- SCOPUS, ESCI, KCI
Article Detail
Home > Article Detail
Micro Raman Spectroscopic Analysis of Local Stress on Silicon Surface in Semiconductor Fabrication Process
Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985
1992, v.5 no.4, pp.359-366
Son,
M. Y., Jung,
J. K., Park,
J. S., &
Kang,
S.
C.
(1992). Micro Raman Spectroscopic Analysis of Local Stress on Silicon Surface in Semiconductor Fabrication Process. Analytical Science and Technology, 5(4), 359-366.
- Downloaded
- Viewed
Abstract
Using micro-Raman spectrometer, we investigated the evaluation of microstress on silicon surface after the local thermal oxidation. The induced stress of silicon surface after local thermal oxidation shows maximum value at the interface of silicon oxide and active area. The smaller the size of active area, the larger stress. From the evaluation of three other device isolation processes, A, B and moB, whose active size has <TEX>$0.45{\mu}m$</TEX> in length, moB process is turned out to have the lowest stress value and the smallest bird's beak effect.
- keywords
- microstress on silicon surface, micro-Raman spectrometry
- Downloaded
- Viewed
- 0KCI Citations
- 0WOS Citations
Other articles from this issue
- The role of matrix modifier for the determination of Lead (Pb) in blood by graphite furnace atomic absorption spectrometry
- Micro Raman Spectroscopic Analysis of Local Stress on Silicon Surface in Semiconductor Fabrication Process
- Response Analysis of the NE213-PSD System for Neutron Energy Spectreum Measurement
- The Study on the Thermal Isomerization of Pinane
- Study on the Radiocarbon Dating with Liquid Scintillation Counting
- Elution Behavior of Pd(II) - Isonitrosoethylacetoacetate Imine Chelates by Reversed Phase High Performance liquid Chromatography
- Ion-Selectrodes based on Calcium Ferrite
- A Study on the Precursor of <TEX>$BaTiO_3$</TEX> Synthesized in Water
- Analysis of Arsenic(III) by the Cathodic Stripping Voltammetry
- Flotation-Concentration of Trace Phosphate Ion in Water Samples by <TEX>$La(OH)_3$</TEX> Coprecipitation
- A Study of Chemical Properties and Fusibility of Korean Anthracite Coal Ash
- A Study on the Hydrolysis and Analysis of o-Chlorobezylidenemalononitrile
- Fourier Transform Infrared Spectroscopic Analysis of the Silylated Resist on Silicon Wafers in Semiconductor Lithographic Process
- Assay of <TEX>$\beta$</TEX>-Galactosidase Using High Performance Liquid Chromatography
- Quantitative Analysis of Microencapsulation of <TEX>$\beta$</TEX>-Galactosidase
- Characteristics of <TEX>$G_{418}$</TEX>-sensitive mitochondrial ATPase/ATP synthase from pleurotus florida
- more
Recommanded Articles
This website recommended the use the Chrome browser for journal website.