- P-ISSN 1225-0163
- E-ISSN 2288-8985
- P-ISSN1225-0163
- E-ISSN2288-8985
- SCOPUS, ESCI, KCI
Article Detail
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Analyzing Surface Microstructure of 7050A1 Alloy Modified by <TEX>$N^+ion$</TEX> Implantation
Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985
1994, v.7 no.4, pp.527-540
Lee,
C. W., Kwun,
S., &
Han,
J.
G.
(1994). Analyzing Surface Microstructure of 7050A1 Alloy Modified by <TEX>$N^+ion$</TEX> Implantation. Analytical Science and Technology, 7(4), 527-540.
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Abstract
The surface microstructure modification by <TEX>$N^+ion$</TEX> implantation into 7050A1 alloy was investigated. Ion implantation method is to implant physically accelerated ions to the surface of a substrate. High doses of nitrogen(<TEX>$5{\times}10^{15}ions/cm^2$</TEX>, <TEX>$5{\times}10^{17}ions/cm^2$</TEX>, <TEX>$8{\times}10^{17}ions/cm^2$</TEX>) were implanted into 7050A1 alloy using accelerating voltage of 100KeV and current density of <TEX>$23.1{\mu}A/cm^2$</TEX>. The implanted layers were characterized by EPMA, AES, XRD, and TEM. The experimental results were compared with computer simulation data. The results showed that AlN was formed from the surface to <TEX>$4000{\AA}$</TEX> depth with Gaussian distribution and the damage region was also observed. This surface modification by <TEX>$N^+ion$</TEX> implantation increased the microhardness of 7050A1 alloy surface.
- keywords
- ion implantation, AlN, damage region, 7050A1 alloy
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