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- E-ISSN 2288-8985
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- P-ISSN1225-0163
- E-ISSN2288-8985
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Current, flow rate and pressure effects in a Gas-Jet-assisted Glow Discharge source
Analytical Science and Technology / Analytical Science and Technology, (P)1225-0163; (E)2288-8985
1994, v.7 no.4, pp.483-492
Lee,
G., Kim,
D., Kim,
E., Kang,
S., Park,
M., Song,
H., Kim,
H., &
Kim,
H.
(1994). Current, flow rate and pressure effects in a Gas-Jet-assisted Glow Discharge source. Analytical Science and Technology, 7(4), 483-492.
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Abstract
Direct solid analysis of various kinds of metal samples has been conducted by glow discharge. In this laboratory, the gas-jet assisted glow discharge(GJGD) device has been developed and characterized. The effect of changes in applied current, cell pressure and flow rate on atomic emission signals obtained from a jet-assisted cathodic sputtering was investigate. The emission intensities of Cu, Zn, and Ar were measured. They were increased with the current. But the intensities were decreased by increasing the flow rate of argon due to the diffusion and transportation of particles into plasma. By increasing the pressure of the cell, the intensities were greatly decreased because of enhancement of redeposition onto the surface of the sample.
- keywords
- Glow Discharge, Direct Solid Analysis, Atomic Emission Spectroscopy
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